Development In Base-Resistant Fluoroelastomers

2003-01-0944

03/03/2003

Event
SAE 2003 World Congress & Exhibition
Authors Abstract
Content
FEPM alternating dipolymers of tetrafluoroethylene (TFE) and propylene (P) are well known to exhibit distinguished chemical resistance, especially against various organic and inorganic bases, compared to conventional fluoroelastomers (FKM): e.g., copolymers of vinylidene fluoride (VdF), hexafluoropropylene (HFP), and optionally incorporated tetrafluoroethylene (TFE). These unique characteristics have been finding automotive sealing applications where lubricants formulated with considerable quantity of additives are used. FEPM dipolymers, however, have difficulty in processing - particularly in mold release. There are TFE-P-VdF terpolymers available, which are improved in mold release. TFE-P-VdF terpolymers, however, are often pointed out that the base resistance is lost to some extent, because the minimum quantity of VdF necessary to establish a practical cure speed and physical properties is not very low. It has been difficult to develop a terpolymer with a minimized content of VdF, which is cured easily and maintains the base resistance of the original FEPM dipolymer.
In this work, controlled polymerization, formulation and compounding technologies achieved a success in minimizing the VdF unit copolymerized into TFE-P polymer structure. Only a small quantity of VdF unit effectively behaves as a cure site for both bisphenol and peroxide cure systems. This new polymer exhibits excellent curability and processability, especially mold release, without losing base resistance.
Meta TagsDetails
DOI
https://doi.org/10.4271/2003-01-0944
Pages
9
Citation
Tate, N., Miwa, T., Saito, M., and Laganis, E., "Development In Base-Resistant Fluoroelastomers," SAE Technical Paper 2003-01-0944, 2003, https://doi.org/10.4271/2003-01-0944.
Additional Details
Publisher
Published
Mar 3, 2003
Product Code
2003-01-0944
Content Type
Technical Paper
Language
English