Maskless Gray-Scale X-Ray Lithography

In a proposed technique of maskless gray-scale x-ray lithography, a photoresist to be patterned would be exposed to a parallel beam of hard x-rays. As explained below, the photoresist would be translated across the beam at a varying rate to effect one-dimensional spatial variations in the radiation dose received by the photoresist. The technique would be particularly suitable for making diffraction gratings and similar items.