Magazine Article

Infrared Technology for Chamber Clean Endpoint Detection

TBMG-48913

09/01/2023

Abstract
Content

Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) processes deposit material on all surfaces in a process chamber. Over time, the thickness of these deposits increases to the point that material begins to delaminate, producing gas-phase particulates that negatively impact process yield. Remote and in situ chemical etching processes are used to periodically remove these deposits from chamber walls, maintaining chamber cleanliness.

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Citation
"Infrared Technology for Chamber Clean Endpoint Detection," Mobility Engineering, September 1, 2023.
Additional Details
Publisher
Published
Sep 1, 2023
Product Code
TBMG-48913
Content Type
Magazine Article
Language
English