Heteroepitaxy with Large Lattice Mismatch

A process for the growth of single-crystal (epitaxial) multilayer films has been developed at the Naval Surface Warfare Center, Dahlgren Division. This process is predicated on the preparation of a compliant interfacial "template" layer of atomic dimensions that can overcome large lattice mismatches. The process can be adopted for the fabrication of integrated electro-optic sensors/receivers, and for new thin-film materials such as the III-nitrides.