Genesis Ultrapure Water Megasonic Wafer Spin Cleaner

A device removes, with high precision, the majority of surface particle contamination greater than 1-micron-diameter in size from ultrapure semiconductor wafer materials containing implanted solar wind samples returned by NASA’s Genesis mission. This cleaning device uses a 1.5- liter/minute flowing stream of heated ultrapure water (UPW) with 1-MHz oscillating megasonic pulse energy focused at 3 to 5 mm away from the wafer surface spinning at 1,000 to 10,000 RPM, depending on sample size.