Low-Cost Detection of Thin Film Stress During Fabrication

  • Magazine Article
  • TBMG-36868
Published May 01, 2020 by Tech Briefs Media Group in United States
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  • English

NASA’s Marshall Space Flight Center has developed a simple, cost-effective optical method for thin film stress measurements during growth and/or subsequent annealing processes. Stress arising in thin film fabrication presents production challenges for electronic devices, sensors, and optical coatings; it can lead to substrate distortion and deformation, impacting the performance of thin film products.