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Sputtering and Ion Plating as Industrial Processes
ISSN: 0148-7191, e-ISSN: 2688-3627
Published February 01, 1973 by SAE International in United States
Annotation ability available
Ion plating and sputtering offer materials engineers versatile coating methods. Both processes use a controlled pressure chamber and vacuum equipment. Sputtering is essentially a line of sight deposition method. The coating material is partially ionized, following electrical lines of force, during ion plating, uniformly coating the substrate configuration. Both processes-their applications and advantages-are discussed. Although the processes are not economically competitive with electroplating or other conventional coating methods, the properties they provide may offset the costs.
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