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Applications of Ion Plating
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English
Abstract
Ion plating is a deposition process whereby high energy ions of plating material are extracted from a plasma at high energy and applied as diffusion coatings to a negatively charged substrate. Ion plating is done in a vacuum and offers an extremely wide choice of material combinations and very fast deposition rates. Thick films of refractory compounds can be ion plated onto surfaces without changing the roughness or topography of the surface. Excellent throwing power offers uniform film thickness even with three-dimensional substrates. The economics of ion plating make it attractive both for decorative and functional applications.
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Citation
White, G., "Applications of Ion Plating," SAE Technical Paper 730546, 1973, https://doi.org/10.4271/730546.Also In
References
- Anderson G. S. Mayer W. N. Wehner G. K. Jour. of Appl. Physics 33 1962 2991
- White G. W. “Recent Development in Corrosion/Erosion Control Using Refractory Materials Deposited by Radio Frequency Sputtering.” Southwest Petroleum Short Course Texas Tech University April 1972
- Buckley D. H. Spalvins T. “Use of Sputtering for Deposition of Solid Film Lubricants.” NASA Lewis Research Center 1972
- Mattox D. M. “Film Deposition Using Accelerated Ions.” Sandia Corp. November 1964