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Diamond Chemical Vapor Deposition on Cutting Tools
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Abstract
The diamond thin films chemical vapor deposition (CVD) on sintered tungsten carbide (WC-Co) tools shows increasing interest in the technological research, due to rapid growing utilization of aluminum alloys, like Al-Si alloys, in the automotive industry. Sintered carbides, mainly diamond coated sintered carbides, are very suitable to machine aluminum alloys.
The cobalt binder that accounts for the WC-Co substrate toughness degrades the interface film-substrate, catalyzing the formation of graphite preferentially to diamond during the deposition process. In addition, stresses are generated in the interface between WC-Co substrate and deposited diamond film due to thermal expansion mismatch. These two factors are a technological neck to large-scale production of diamond CVD coatings for machining tools.
In this work, several interface pre-treatments were developed and applied resulting in high film-substrate adherence, adequate for machining tool purposes.
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Barquete, D., de Resende, L., Corat, E., Trava-Airoldi, W. et al., "Diamond Chemical Vapor Deposition on Cutting Tools," SAE Technical Paper 982876, 1998, https://doi.org/10.4271/982876.Also In
References
- ANGUS, J.C. Development of Low Pressure Diamond Growth in the United States SPEAR, K.E. DISMUKES, J.P. Synthetic Diamond: Emerging CVD Science and Technology New York John Wiley & Sons, Inc. 1994 21 39
- MATSUMOTO, S. SATO, Y. TSUTSUMI, M. SETAKA, N. Growth of diamond particles from methane-hydrogen gas J. Mater. Sci . 17 3106 12 1982
- YAZU, S. NAKAI, T. Tool application of diamond and CBN TZENG, Y. YOSHIKAWA, M. YOSHIMURA, H. Applications of Diamond and Related Materials Elsevier Science Publishers B.V. 1991 37 42
- CORAT, E.J. TRAVA-AIROLDI, V.J. LEITE, N.F. NONO, M.C.A. BARANAUSKAS, V. Diamond growth with CF 4 addition in hot filament chemical vapor deposition J. Mater. Sci . 32 0001 7 1997
- GRANNEN, K.J. CHANG, R.P.H. Diamond growth on carbide surfaces using a selective etching technique J. Mater. Res . 9 2154 63 1994
- BORGES, C.F.M. MOISAN, M. MARTINU, L. TRAVA-AIROLDI, V.J. CORAT, E.J. Effect of ion-assisted plasma pretreatment of WC-Co surface for enhanced diamond adhesion 1997
- JINDAL, P.C. QUINTO, D.T. WOLFE, G.J. Adhesion measurements of chemically vapor deposited and physically vapor deposited hard coatings on WC-Co substrates Thin Solids Films 154 361 75 1987
- GRANNEN, K.J. XIONG, F. CHANG, R.P.H. A comparison study of diamond films grown on tungsten carbide cobalt tool inserts with CH 4 and CF 4 gas sources Surface and Coatings Technology 57 155 62 1993