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Development of Digital Shearography for Dual Sensitivity Simultaneous Measurement Using Carrier Frequency Spatial Phase Shift Technology
Technical Paper
2023-01-0068
ISSN: 0148-7191, e-ISSN: 2688-3627
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English
Abstract
Digital shearography has many advantages, such as full-field, non-contact, high sensitivity, and good robustness. It was widely used to measure the deformation and strain of materials, also to the application of nondestructive testing (NDT). However, most digital sherography applications can only work in one field of view per measurement, and some small defects may not be detected as a result. Multiple measurements of different fields of view are needed to solve this issue, which will increase the measurement time and cost. The difficulty in performing multiple measurements may also increase for cases where the loading is not repeatable. Therefore, a system capable of measuring dual fields of view at the same time is necessary. The carrier frequency spatial phase shift method may be a good candidate to reach this goal because it can simultaneously record phase information of multiple images, e.g. two speckle interferograms with different fields of view. It then obtains the phase information of each interferogram by separating them from the spectrum using the Fourier Transform (FT) method. The challenge of using this method is that the phase information can partially overlap on the spectrogram, resulting in a bad phase map. This paper presents a new idea for separating the phase information on the spectrogram. The new idea adjusts the shearing directions, leading to complete separation of the spectrums of the two images, e.g. one in the horizontal direction and the other in the vertical direction. The phase information of each interferogram can then be excavated by windowing the corresponding spectrum and taking the inverse Fourier Transform. In digital shearography, the phase information is directly related to gradient of surface deformation; thus, gradient of surface deformation with different fields of view, also called dual sensitivity, can be obtained. The principle of this method will be described and demonstrated by experiment results.
Authors
Citation
Zheng, X., Guo, B., Fang, S., Sia, B. et al., "Development of Digital Shearography for Dual Sensitivity Simultaneous Measurement Using Carrier Frequency Spatial Phase Shift Technology," SAE Technical Paper 2023-01-0068, 2023, https://doi.org/10.4271/2023-01-0068.Also In
References
- Hung , Y.Y. Shearography: A New Optical Method for Strain Measurement and Nondestructive Testing Opt. Eng. 21 1982 213391
- Yang , L. and Xie , X. Digital Shearography–New Developments and Applications SPIE Press 2016
- Zhang , B. , Zheng , X. , Xu , W. , and Yang , L. Overview of Digital Shearography for NDT Mater. Eval. 78 3 2020
- Mihaylova , E. , Naydenova , I. , Martin , S. , and Toal , V. Simple Electronic Speckle Patternshearing Interferometer with a Holographic Grating as a Shearing Element SPIE 5962 2005 596226
- Yang , L. , Chen , F. , Steinchen , W. , and Huang , M.Y. Digital Shearography for Nondestructive Testing: Potentials, Limitations, and Applications JOHAS 1 2 2004 69 79
- Steinchen , W. and Yang , L. Digital Shearography: Theory and Application of Digital Speckle Pattern Shearing Interferometry SPIE Optical Engineering Press 2003
- Siebert , T. and Schmitz , B. New Shearing Setup for Simultaneous Measurement of Two Shear Directions SPIE 3637 1999 225 230
- Pedrini , G. , Zou , Y.L. , and Tiziani , H.J. Quantitative Evaluation of Digital Shearing Interferogram Using the Spatial Carrier Method Pure Appl. Opt: J. Eur. Opt. Soc., Part A 5 3 1996 313
- Wang , Y. , Gao , X. , Xie , X. , Wu , S. et al. Simultaneous Dual Directional Strain Measurement Using Spatial Phase-Shift Digital Shearography Opt. Laser Eng. 87 2016 197 203
- Zhao , Q. , Chen , W. , Sun , F. , Yan , P.Z. et al. Simultaneous 3D Measurement of Deformation and Its First Derivative with Speckle Pattern Interferometry and Shearography Applied Optics 58 31 2019 8665 8672
- Xie , X. , Lee , C.P. , Li , J. , Zhang , B. et al. Polarized Digital Shearography for Simultaneous Dual Shearing Directions Measurements Rev. Sci. Instrum. 87 8 2016 083110
- Zhang , B. , Zheng , X. , Guo , B. , Fang , S. et al. Sagnac Interferometer Based Digital Shearography for Simultaneous Dual Sensitivity Measurement Optics and Lasers in Engineering 152 2022 106984
- Xie , X. , Yang , L. , Xu , N. , and Xu , C. Michelson Interferometer Based Spatial Phase Shift Shearography Applied Optics 52 17 2013 4063 4071
- Steinchen , W. and Yang , L. Digital Shearography: Theory and Application of Digital Speckle Pattern Shearing Interferometry SPIE 2003 116 122
- Xie , X. , Xu , N. , Sun , J. , Wang , Y. et al. Simultaneous Measurement of Deformation and the First Derivative with Spatial Phase-Shift Digital Shearography Opt. Commun. 286 2013 277 281
- Sagnac , G. The Demonstration of the Luminiferous Aether by an Interferometer in Uniform Rotation Comptes Rendus 157 1913 708 710