This content is not included in
your SAE MOBILUS subscription, or you are not logged in.
Optimization of RF Magnetron Sputtering Parameters for Deposition of Zinc Oxide Semiconductor Film at Moderate Temperature of 100°C
Technical Paper
2019-28-0150
ISSN: 0148-7191, e-ISSN: 2688-3627
This content contains downloadable datasets
Annotation ability available
Sector:
Language:
English
Abstract
Zinc oxide semiconductor thin films are deposited on glass substrate at different RF magnetron sputtering parameters. The deposited films were characterized as a function of substrate - target distance, gas flow ratio, working pressure and RF power. X-ray diffraction, Field emission scanning electron microscopy, and hall measurement were utilized to analyze the effect of the deposition condition on the structure, surface morphology and electrical properties of ZnO thin films. The deposition conditions were optimized to give good quality films suitable for the application of flexible or invisible flat panel display. All the films were deposited at 100°C.
Authors
Citation
Muthukarappan, A., Jeyaseelan, C., Paramathma, B., and Park, S., "Optimization of RF Magnetron Sputtering Parameters for Deposition of Zinc Oxide Semiconductor Film at Moderate Temperature of 100°C," SAE Technical Paper 2019-28-0150, 2019, https://doi.org/10.4271/2019-28-0150.Data Sets - Support Documents
| Title | Description | Download |
|---|---|---|
| Unnamed Dataset 1 | ||
| Unnamed Dataset 2 |
Also In
References
- Banerjee , A.N. , Joo , S.W. , and Min , B.K. Nanocrystalline ZnO Thin Film Deposition on Flexible Substrate by Low-Temperature Sputtering Process for Plastic Displays J. Nanosci. Nanotechnol 14 10 7970 7975 2014
- Lin , Y.-Y. , Hsu , C.-C. , Tseng , M.-H. , Shyue , J.-J. , and Tsai , F.-Y. Stable and High Performance Flexible ZnO Thin Film Transistors by Atomic Layer Deposition ACS Appl. Mater. Inter 7 40 22610 22617 2015
- Tian , K. , Tudu , B. , and Tiwari , A. Growth and Characterization of Zinc Oxide Thin Films on Flexible Substrates at Low Temperature Using Pulsed Laser Deposition Vacuum 146 483 491 2017
- Belmoubarik , M. , Nozaki , T. , Endo , H. , and Sahashi , M. Investigation of ZnO Thin Films Deposited on Ferromagnetic Metallic Buffer Layer by Molecular Beam Epitaxy toward Realization of ZnO-Based Magnetic Tunneling Junction J. Appl. Phys 113 17C106 2013
- Li , X. , Shen , R. , Zhang , B. , Dong , X. et al. Nitrogen Doped ZnO Thin Films Prepared by Photo Assisted Metal-Organic Chemical Vapor Deposition J. Nanosci. Nanotechnol 11 11 9741 9744 2011
- Oruc , F.B. , Aygun , L.E. , Donmez , I. , Biyikli , N. , and Okyaya , A.K. Low Temperature Atomic Layer Deposited ZnO Photo Thin Film Transistors J. Vacuum. Sci. Technol 33 1 01A105 01A101 2015
- Peksu , E. and Karaagac , H. Doping and Annealing Effects on Structural, Electrical and Optical Properties of Tin-Doped Zinc-Oxide Thin Films J. Alloys. Compd 764 616 625 2018
- Dahnoun , M. , Attaf , A. , Saidi , H. , Yahia , A. , and Khelifi , C. Structural, Optical and Electrical Properties of Zinc Oxide Thin Films Deposited by Sol-Gel Coating Technique Optik 134 53 59 2017
- Dominguez , M.A. , Flores , F. , Martinez , J. , and Orduna-Diaz , A. Effects of Low Temperature Annealing on Electrical Properties of Thin Film Transistors Based on Zinc Oxide Films Deposited by Ultrasonic Spray Pyrolysis: Impact of Annealing Time Thin Solid Films 615 243 246 2016
- Sidek , F. , Noedin , A.N. , and Othman , R. Optimization of Zinc Oxide Thin Films for Silicon Surface Acoustic Wave Resonator Applications Adv. Mater. Res 518-523 3772 3779 2012
- Abdallaha , B. , Jazmatia , A.K. , and Refaaia , R. Oxygen Effect on Structural and Optical Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering Mater. Res 20 3 607 612 2017
- Viswanathan , K. , Shyju , T.S. , Ramachandran , D. , and Pradhaban , G. Electric Properties of ZnO Thin Films by RF Magnetron Sputtering Technique Mater. Today. Proc 3 1548 1552 2016
- Kim , C. , Kim , S. , and Lee , C. Effects of RF Power and Substrate Temperature during RF Magnetron Sputtering on Crystal Quality of ZnO Thin Films Jpn. J. Appl. Phys 44 12 8501 8503 2005
- Muchuweni , E. , Sathiaraj , T.S. , and Nyakotyo , H. Physical Properties of Gallium and Aluminium Co-Doped Zinc Oxide Thin Films Deposited at Different Radio Frequency Magnetron Sputtering Power Ceram. Int 42 15 17706 17710 2016
- Dave , P.Y. , Patel , K.H. , Chauhan , K.V. , Chawla , A.K. , and Rawal , S.K. Examination of Zinc Oxide Films Prepared by Magnetron Sputtering Proc. Technol 23 328 335 2016
- Settaouti , A. and Settaouti , L. Simulation of the Transport of Sputtered Atoms and Effects of Processing Conditions Appl. Surf. Sci 254 5750 5756 2008
- Bortoletoa , J.R.R. , Chavesa , M. , Rosab , A.M. , Da Silvaa , E.P. et al. Growth Evolution of Self-Textured ZnO Films Deposited by Magnetron Sputtering at Low Temperatures Appl. Surf. Sci 334 210 215 2015
- Tüzemen , S. , Xiong , G. , Wilkinson , J. , Mischuck , B. et al. Production and Properties of P-N Junctions in Reactively Sputtered ZnO Physica B: Condensed Matter 308 1197 1200 2001
- Xiong , G. , Wilkinson , J. , Mischuck , B. , Tüzemen , S. et al. Control of P- and N-Type Conductivity in Sputter Deposition of Undoped ZnO Appl. Phys. Lett 80 7 1195 1197 2002
- Yao , Q.J. and Li , D.J. Fabrication and Property Study of Thin Film Transistor Using Rf Sputtered ZnO as Channel Layer J. Non-Cryst. Solids 351 3191 3194 2005
- Menon , R. , Sreenivas , K. , and Gupta , V. Influence of Stress on the Structural and Dielectric Properties of Rf Magnetron Sputtered Zinc Oxide Thin Film J. Appl. Phys 103 094903 2008
- Houng , B. , Hsi , C.S. , Hou , B.Y. , and Fu , S.L. Effect of Process Parameters on the Growth and Properties of Impurity-Doped Zinc Oxide Transparent Conducting Thin Films by RF Magnetron Sputtering Vacuum 83 3 534 539 2008